Beijing Kehua and DuPont reached a strategic cooperation to promote the development of China’s advanced lithography materials industry

Recently, at the site of the 4th CIIE, DuPont Electronics and Industrial Division (hereinafter referred to as “DuPont”) and Beijing Kehua Microelectronics Materials Co., Ltd. (hereinafter referred to as “Beijing Kehua”), a subsidiary of Red Avenue New Materials Group Co., Ltd. ) announced a partnership program to provide high-performance lithography materials to Chinese integrated circuit chip makers. Leveraging the strengths of both companies, the collaboration aims to meet industry demands for advanced photoresists and other lithography materials.

Chinese chipmakers have announced the start of construction of eight new fabs by 2022, according to the quarterly global fab forecast report released by the semiconductor Industry Association (SEMI). These new fabs will accelerate the development of China’s domestic semiconductor industry, driving growing demand for raw materials, Electronic chemicals and local supplies in the coming years. The cooperation between DuPont and Beijing Kehua will help Beijing Kehua to quickly provide various high-performance lithography materials and help customers in Greater China develop.

According to public information, DuPont is the world’s leading supplier of semiconductor materials, and has launched a large number of recognized photolithography products of various wavelengths, including 193nm (ArF), 248nm (KrF) and i/g-line photoresists, As well as carbon film coatings (SOC), anti-reflection coatings (BARC), advanced surface coatings and photoresist supporting reagents.

As one of the holding companies of Red Avenue New Materials, Beijing Kehua is a national high-tech enterprise with independent intellectual property rights specializing in the research and development, production and sales of photoresist and its supporting reagents. Its product applications cover integrated circuits (IC), light-emitting diodes (LED), discrete devices, advanced packaging, micro-electromechanical systems (MEMS), etc., product types cover KrF (248nm), G/I line (including broad spectrum); negative glue used in Lift-off process; BP series, etc., has grown into one of the largest local suppliers of integrated circuit photoresist in China since its establishment nearly 20 years ago.

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